TechRes - Innores Co., Ltd.

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Seal & O-Ring

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Innores Co., Ltd.
[Korea]

Address:
#205, Sungshin-Techno Park, 509-7, Maetan 3-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-803 Korea

Phone:
82-31-2748431

Contact name:
Jeanie Park

Seal & O-Ring

	TechRes

Click to enlarge image

Model Number

TechRes 3075

Description

Techres 3075 has high resistance power against chemicals, cleaning gas such as CIF3 that generated from Process of Etching, Ashing and CVD. It is a high-purified product with minimized metal content. This white perfluoroelastomer was developed based on resistance power that minimizes low weight loss and low outgassing in O2 and NF3 plasma system. Especially, this product saves cost with its superior seal function in semiconductor production line that does not require resistance powering high temperature. When applied with high temperature, the maximum constant temperature og 250 degree is suitable.

Applicable Temperature : 20° ~ 260°C

Applicable Process

CVD/Oxidation, Coater/Developer, CVD, Wet Etch, Dry Etch, Cleaning, Resist Stripping, Ion Implant, PVD

Certificate Inspection

PROPERTY DESCRIPTION	TEST RESULT
TENSILE STRENGTH	Mpa	14.85
ELONGATION AT BREAKE	%	165
100% MODULUS	Mpa	8.0
SHORE A HARDNESS	±2	75
MAX TEMPERATURE	℃	280
COMPRESSION SET ON O-RING #214 @200℃ 70HRS	18

LABORATORY TEST

※ TEST MARKS
A: Rate of volume increase within 5%
B: Rate of volume increase 5~20%
C: Rate of volume increase 20~50%
D: Rate of volume increase over 50%

Name of Chemicals	Deposition Temperature		Deposition Time/Days	FFKM (TechRes)	FKM (Viton)
Name of Chemicals	℃	℉	Deposition Time/Days	FFKM (TechRes)	FKM (Viton)
(Acid fluids)
Acetic anhydride	40	104	21	A	D
Chlorosulfonic acid	23	73	7	B	D
Formic acid(88%)	40	104	21	A	D
Glacial acetic acid	40	104	21	A	D
Hydrochloric acid(35%)	40	104	21	A	B
Hydrofluoric acid(50%)	80	176	7	A	B
Hyrogen sulfide	60	140	7	B	D
Nitric acid(60%)	40	104	21	A	D
Phosphoric acid(45%)	60	160	7	A	D
Phenol	220	428	7	A	D
Sulfuric acid(98%)	40	104	10	A	A

Related Keywords: Synthetic Rubber , TechRes

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